Michimich.com - k-Space Associates, Inc. Celebrates its 30-Year Anniversary

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Thin-film metrology company started as university spinoff now has thousands of customers worldwide.

DEXTER, Mich. - Michimich -- k-Space Associates, Inc. is celebrating 30 years of helping the world's leading technology makers develop, monitor, control, and manufacture their products in the thin-film, semiconductor, solar and glass markets, to name a few.

Darryl Barlett, CEO of k-Space Associates, Inc., stated, "After 30 years it's still so satisfying to walk into a laboratory or a manufacturing facility and see our metrology tools being used in real-time for process monitoring and control."

k-Space exploits the power of light for precise measurements, hence its slogan "Putting light to work since 1992". k-Space's thin-film metrology applications employ patented methods to accurately measure and monitor wafer temperature, stress, curvature, bow, deposition rate, reflectivity, spectral reflectance and transmission, and reflection high-energy electron diffraction (RHEED). On the industrial metrology side, k-Space's tools are used in production facilities worldwide to measure precise part features, surface defects, and more to ensure high yield and quality compliance.

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These measurements are vital for the manufacturing of semiconductor chips, solar panels, architectural glass, building materials, and other products.

k-Space has distributors in Europe, India, China, Japan, Korea, and throughout the world. Through extensive customer input, close collaboration with its worldwide customer base, and a strong commitment to unparalleled technical support, k-Space continues to develop new solutions that help its customers fulfill even their most complex metrology needs. "You can never stop innovating!" remarked Barlett.

For more information, please visit http://www.k-space.com.

About k-Space Associates, Inc.

k-Space Associates, Inc. (www.k-space.com) is a leading supplier of advanced metrology instrumentation and software used in research and production facilities around the world. Founded in 1992, its thin-film metrology systems monitor wafer and thin-film temperature, stress, curvature, bow, deposition rate, thickness, reflectivity, spectral reflectance and transmission, and Reflection High Energy Electron Diffraction (RHEED). Researchers and manufacturers use our ex situ and in situ systems for development, monitoring, and process control applications. Through extensive customer input, close collaboration with its worldwide customer base, and a strong commitment to unparalleled technical support, k‑Space has developed today's most powerful thin-film metrology tools.

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